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Nitrogen trifluoride
Packaging: 17L、44L
Appearance: It is a colorless, odorless, and stable gas at room temperature
Purity (%): 99.99%
Melting point: -206.8°C
Boiling point: -129°C
Critical temperature: -39.3°C
Critical pressure: 4.46Mpa
Product Details
| Entry name | Purity index (%) | |
| Nitrogen trifluoride | ≥99.99 | |
| Impurity content (ppm) | Nitrogen (N2) | ≤5 |
| Oxygen+argon (O2+Ar) | ≤3 | |
| Carbon dioxide (CO2) | ≤5 | |
| Carbon monoxide (CO) | ≤1 | |
| Carbon tetrafluoride (CF4) | ≤40 | |
| Water (H2O) | ≤1 | |
| Sulfur hexafluoride (SF6) | ≤5 | |
| Hydrogen fluoride (HF) | ≤1 | |
| Nitrous oxide (N2O) | ≤5 | |
Product Usage: NF3 is an excellent plasma etching gas in the microelectronics industry. For the etching of silicon and silicon nitride, the use of a mixture of NF3 and CF4+O2 gas has a higher etching rate and selectivity, and does not pollute the surface.
